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- W2532712859 abstract "We demonstrate a notched W/TiN gate MOSFET for which both threshold voltage adjustment and suppression of the short channel effect are achieved simultaneously. To lower the threshold voltage, low channel doping concentration and high dose-low energy counter-doping are combined with high-dose tilted pocket implant performed using notched gate. Due to presence of notches, near optimal pocket implant distribution in the channel is achieved." @default.
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- W2532712859 date "2002-11-11" @default.
- W2532712859 modified "2023-09-26" @default.
- W2532712859 title "A notched metal gate MOSFET for sub-0.1 μm operation" @default.
- W2532712859 doi "https://doi.org/10.1109/iedm.2000.904405" @default.
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