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- W2533132024 abstract "Results of another molecular design of the negative-tone molecular resist for improvement of sensitivity were discussed. Frictional force spectroscopy (FFS) was performed for investigating thermal property of resist films by a scanning probe microscope (SPM) with sweeping temperature. Depth profile of the resist components was measured by TOF-SIMS with gradient shaving preparation. EB lithographic characteristics of the resists were evaluated and EUV imaging was performed." @default.
- W2533132024 created "2016-10-28" @default.
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- W2533132024 date "2007-11-01" @default.
- W2533132024 modified "2023-09-27" @default.
- W2533132024 title "Negative-Tone Molecular Resist with High-Sensitivity for EUV and EB Lithography" @default.
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- W2533132024 doi "https://doi.org/10.1109/imnc.2007.4456289" @default.
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