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- W2536777626 abstract "Boron segregation and transient enhanced diffusion (TED) of boron atoms during annealing were investigated under two types of wafers implanted with Si ions. We found the following facts: (1) boron segregation to {311} defects has been observed at low temperature annealing. (2) {311} defects were formed in the area where the self-interstitial concentration exceeds 3/spl times/10/sup 17/ cm/sup -3/. (3) Free self-interstitials in the region beyond the implanted range causes initial rapid enhanced diffusion prior to the onset of normal TED." @default.
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- W2536777626 date "2002-11-27" @default.
- W2536777626 modified "2023-09-25" @default.
- W2536777626 title "Experiments and modeling of boron segregation to {311} defects and initial rapid enhanced boron diffusion induced by self-implantation in Si" @default.
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- W2536777626 doi "https://doi.org/10.1109/iedm.1998.746406" @default.
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