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- W2537281412 abstract "The authors demonstrate that the optimal 2-D collector doping profile for BiCMOS technologies is a strong function of the intended circuit application of the BJT (bipolar junction transistor). The 2-D collector doping profile in this study was tailored by selectively implanting the collector (SIC) into only the intrinsic region of the BJT. A controlled comparison between SIC and conventional collector implant devices was made by keeping BV/sub CEO/ and beta invariant. It is concluded that selectively implanting the collector into the intrinsic area is advantageous for low-current, but detrimental for high-current gates. >" @default.
- W2537281412 created "2016-10-28" @default.
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- W2537281412 date "2002-12-09" @default.
- W2537281412 modified "2023-09-26" @default.
- W2537281412 title "Optimization of two-dimensional collector doping profiles for submicron BiCMOS technologies" @default.
- W2537281412 cites W1986392632 @default.
- W2537281412 cites W2034091026 @default.
- W2537281412 doi "https://doi.org/10.1109/iedm.1991.235287" @default.
- W2537281412 hasPublicationYear "2002" @default.
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