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- W2540351626 abstract "Lower defect densities are required for advanced lithography processes. A new photochemical filtration technology using a nonsieving membrane on the upstream side and a sieving membrane on the downstream side of the filter will be shown to effectively reduce bridging defects on the wafer. This “dual-capture” mechanism provides high gel particle retention in photolithography applications." @default.
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- W2540351626 date "2008-10-01" @default.
- W2540351626 modified "2023-09-24" @default.
- W2540351626 title "Defect reduction in advanced lithography processes using a new dual functionality filter" @default.
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