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- W2540514163 abstract "In this paper, we report an experimental evidence of the impact of applied a low magnetic field (B it ) and oxide trap (ΔN ot ) induced by NBTI stress decrease by applied magnetic field. This decrease is more pronounced as the magnetic field is high. In addition, the recovery of NBTI induced threshold voltage shift (ΔV th ) is relatively important with applied magnetic field." @default.
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- W2540514163 date "2014-10-01" @default.
- W2540514163 modified "2023-09-25" @default.
- W2540514163 title "Investigation of NBTI degradation on power VDMOS transistors under magnetic field" @default.
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- W2540514163 doi "https://doi.org/10.1109/iirw.2014.7049530" @default.
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