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- W2541124223 abstract "This paper reviews the current critical issues on the fabrication of Ge surface channel MOSFET devices. Compared with surface channel Ge MOSFETs, strained Ge buried channel structures can be integrated with fewer processing challenges to achieve significantly enhanced hole mobility and an improved electron mobility. The device design and scalability of the strained Ge buried channel MOSFETs are presented based on our recent results." @default.
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- W2541124223 date "2005-06-07" @default.
- W2541124223 modified "2023-09-26" @default.
- W2541124223 title "Fabrication, device design and mobility enhancement of germanium channel MOSFETs" @default.
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- W2541124223 doi "https://doi.org/10.1109/icsict.2004.1435013" @default.
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