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- W2541567204 abstract "The current status and future trend of analytical instruments are discussed. Analytical instruments for failure analyses in sub-1/4 micron dimensions or less, require high spatial resolution and sensitivity at atomic levels. Using new analytical instruments, such as the nano-prober for electrical characteristics inspection in actual circuits, TEM-EELS for chemical bond analysis of nanometer area and GDS for precise composition analysis, it was found that a SiO/sub 2/ or TiO/sub x/ film formed by water from titanic acid (TiO/sub x/H/sub 2/O) produced with titan, water and chlorine, was a cause of high resistivity for a contact (CVD-W/CVD=TiN/Ti/Si) in sub-1/4 micron devices." @default.
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- W2541567204 date "2002-11-28" @default.
- W2541567204 modified "2023-09-27" @default.
- W2541567204 title "Physical and chemical analytical instruments far failure analyses in Gbit devices" @default.
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- W2541567204 doi "https://doi.org/10.1109/iedm.1998.746366" @default.
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