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- W2543060740 abstract "A 65nm NOR flash technology, featuring a true 10lambda2 , 0.042mum2 cell, is presented for the first time for 1bit/cell and 2bit/cell products. Advanced 193nm lithography, floating gate self aligned STI, cobalt salicide and three levels of copper metallization allow the integration with a high density and high performance 1.8V CMOS" @default.
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- W2543060740 date "2006-04-07" @default.
- W2543060740 modified "2023-10-10" @default.
- W2543060740 title "A 65nm NOR flash technology with 0.042μm/sup 2/ cell size for high performance multilevel application" @default.
- W2543060740 cites W1977709938 @default.
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- W2543060740 doi "https://doi.org/10.1109/iedm.2005.1609490" @default.
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