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• W2546866977 abstract "Using pulsed excimer laser thin C <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>60</sub> films were deposited at room temperature. C <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>60</sub> /p-silicon heterojunction was fabricated by deposition of C <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>60</sub> on the silicon substrate. Nitrogen gas was introduced in the pulsed laser deposition chamber. The nitrogen partial pressure (NPP) is varied. The optical gap increases with higher NPP and for the film deposited at NPP 60 mTorr and above the optical gap become suitable for optoelectronic application. The optical gap of films is observed to be from about 1.8 to 2.8 eV. The current density- voltage (J-V) characteristics show tremendous improvement with nitrogen incorporation. At high NPP, high value of the Tauc parameter indicates less disorder. The promising properties of the C <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>60</sub> films make them interesting for the optoelectronic applications." @default.
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• W2546866977 date "2012-12-01" @default.
• W2546866977 modified "2023-09-26" @default.
• W2546866977 title "Nitrogen incorporated fullerene (C<inf>60</inf>) films using pulsed laser deposition for optoelectronic application" @default.
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• W2546866977 doi "https://doi.org/10.1109/icece.2012.6471495" @default.
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