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- W2552841958 abstract "• ISMI can provide industry with unique challenging test wafers down to 13nm and methods for defect detection, characterization and yield enhancement, collaborating with academia and suppliers. • As bright-field detection in the far-field loses its ability to discriminate defect of interest beyond 22 nm node, new alternatives must be explored. • RPM and SHI are introduced as examples of our candidate technologies for next generation inspection." @default.
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- W2552841958 date "2010-10-01" @default.
- W2552841958 modified "2023-09-23" @default.
- W2552841958 title "Potential technologies for next generation defect inspection" @default.
- W2552841958 hasPublicationYear "2010" @default.
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