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- W2556367252 abstract "Mask aligner lithography is one of the most widely used technologies for micro-optical elements fabrication. It offers a high throughput with high-yield processing. With different resolution enhancement technologies shadow printing is a mature alternative to the more expensive projection or electron-beam lithography. We are presenting a novel mask aligner tool that allows shifting the photomask with high accuracy between sequential exposure shots. It offers possibilities such as double patterning or gray tone lithography by applying different light doses at different locations. Within this publication, we show the first results for high resolution blazed grating structures generated in photoresist by multiple exposures using a conventional binary photomask." @default.
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- W2556367252 date "2016-11-15" @default.
- W2556367252 modified "2023-09-27" @default.
- W2556367252 title "Photomask displacement technology for continuous profile generation by mask aligner lithography" @default.
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- W2556367252 doi "https://doi.org/10.1088/2040-8978/18/12/125401" @default.
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