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• W2561617245 abstract "In this paper we describe a method for surface fabrication of metallic microchannels. Arrays of five and seven microchannels have been fabricated using thick photoresist as a sacrificial layer. The microchannels are fabricated on a silicon and glass substrates using nickel as the structural material and gold as the coating of inside walls. Individual microchannels range from 30 /spl mu/m to 1.5 mm in width, 500 /spl mu/m to several mm in length, and 13 /spl mu/m to 30 /spl mu/m in thickness. The microchannel fabrication technology allows fabrication of relatively large cross sectional surface microchannels using a low temperature process that is compatible with integrated circuit (IC) fabrication technology as a post process." @default.
• W2561617245 created "2017-01-06" @default.
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• W2561617245 date "2002-11-22" @default.
• W2561617245 modified "2023-09-27" @default.
• W2561617245 title "A low temperature IC compatible process for fabricating surface micromachined metallic microchannels" @default.
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• W2561617245 doi "https://doi.org/10.1109/memsys.1997.581842" @default.
• W2561617245 hasPublicationYear "2002" @default.
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