FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W2562189211> ?p ?o ?g. }

• W2562189211 endingPage "3825" @default.
• W2562189211 startingPage "3818" @default.
• W2562189211 abstract "A generic and universal layer engineering strategy for van der Waals (vW) materials, scalable and compatible with the current semiconductor technology, is of paramount importance in realizing all-two-dimensional logic circuits and to move beyond the silicon scaling limit. In this letter, we demonstrate a scalable and highly controllable microwave plasma based layer engineering strategy for MoS2 and other vW materials. Using this technique we etch MoS2 flakes layer-by-layer starting from an arbitrary thickness and area down to the mono- or the few-layer limit. From Raman spectroscopy, atomic force microscopy, photoluminescence spectroscopy, scanning electron microscopy and transmission electron microscopy, we confirm that the structural and morphological properties of the material have not been compromised. The process preserves the pre-etch layer topography and yields a smooth and pristine-like surface. We explore the electrical properties utilising a field effect transistor geometry and find that the mobility values of our samples are comparable to those of the pristine ones. The layer removal does not involve any reactive gasses or chemical reactions and relies on breaking the weak inter-layer vW interaction making it a generic technique for a wide spectrum of layered materials and heterostructures. We demonstrate the wide applicability of the technique by extending it to other systems such as graphene, h-BN and WSe2. In addition, using microwave plasma in combination with standard lithography, we illustrate a lateral patterning scheme making this process a potential candidate for large scale device fabrication in addition to layer engineering." @default.
• W2562189211 created "2017-01-06" @default.
• W2562189211 creator A5012123058 @default.
• W2562189211 creator A5041279753 @default.
• W2562189211 creator A5088326784 @default.
• W2562189211 date "2017-01-01" @default.
• W2562189211 modified "2023-09-25" @default.
• W2562189211 title "Topography preserved microwave plasma etching for top-down layer engineering in MoS₂and other van der Waals materials" @default.
• W2562189211 cites W1789081234 @default.
• W2562189211 cites W1900405992 @default.
• W2562189211 cites W1907704756 @default.
• W2562189211 cites W1975628705 @default.
• W2562189211 cites W1978279714 @default.
• W2562189211 cites W1979806836 @default.
• W2562189211 cites W1984200468 @default.
• W2562189211 cites W1998889532 @default.
• W2562189211 cites W1999049345 @default.
• W2562189211 cites W1999476436 @default.
• W2562189211 cites W2021994802 @default.
• W2562189211 cites W2022247519 @default.
• W2562189211 cites W2039086015 @default.
• W2562189211 cites W2072836371 @default.
• W2562189211 cites W2074276838 @default.
• W2562189211 cites W2087035160 @default.
• W2562189211 cites W2100753771 @default.
• W2562189211 cites W2101606767 @default.
• W2562189211 cites W2105471555 @default.
• W2562189211 cites W2105693231 @default.
• W2562189211 cites W2116294656 @default.
• W2562189211 cites W2134233006 @default.
• W2562189211 cites W2136240597 @default.
• W2562189211 cites W2136334331 @default.
• W2562189211 cites W2147161538 @default.
• W2562189211 cites W2154044591 @default.
• W2562189211 cites W2157876253 @default.
• W2562189211 cites W2163433444 @default.
• W2562189211 cites W2163644962 @default.
• W2562189211 cites W2258611351 @default.
• W2562189211 cites W2270192788 @default.
• W2562189211 cites W2279890181 @default.
• W2562189211 cites W2284566726 @default.
• W2562189211 cites W2297724148 @default.
• W2562189211 cites W2315000923 @default.
• W2562189211 cites W2316678935 @default.
• W2562189211 cites W2332278225 @default.
• W2562189211 cites W2335202810 @default.
• W2562189211 cites W2335474123 @default.
• W2562189211 cites W2396620866 @default.
• W2562189211 cites W2417044268 @default.
• W2562189211 cites W2428337938 @default.
• W2562189211 cites W2462847628 @default.
• W2562189211 cites W2466620096 @default.
• W2562189211 cites W2509062696 @default.
• W2562189211 cites W2513028139 @default.
• W2562189211 cites W2517550750 @default.
• W2562189211 cites W2535964096 @default.
• W2562189211 cites W2539877469 @default.
• W2562189211 cites W3101929953 @default.
• W2562189211 cites W3102298309 @default.
• W2562189211 cites W3103538292 @default.
• W2562189211 cites W3105065576 @default.
• W2562189211 cites W311506293 @default.
• W2562189211 doi "https://doi.org/10.1039/c7nr00284j" @default.
• W2562189211 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/28304057" @default.
• W2562189211 hasPublicationYear "2017" @default.
• W2562189211 type Work @default.
• W2562189211 sameAs 2562189211 @default.
• W2562189211 citedByCount "13" @default.
• W2562189211 countsByYear W25621892112017 @default.
• W2562189211 countsByYear W25621892112018 @default.
• W2562189211 countsByYear W25621892112019 @default.
• W2562189211 countsByYear W25621892112020 @default.
• W2562189211 countsByYear W25621892112021 @default.
• W2562189211 crossrefType "journal-article" @default.
• W2562189211 hasAuthorship W2562189211A5012123058 @default.
• W2562189211 hasAuthorship W2562189211A5041279753 @default.
• W2562189211 hasAuthorship W2562189211A5088326784 @default.
• W2562189211 hasBestOaLocation W25621892112 @default.
• W2562189211 hasConcept C100460472 @default.
• W2562189211 hasConcept C108225325 @default.
• W2562189211 hasConcept C120665830 @default.
• W2562189211 hasConcept C121332964 @default.
• W2562189211 hasConcept C126061179 @default.
• W2562189211 hasConcept C136525101 @default.
• W2562189211 hasConcept C142724271 @default.
• W2562189211 hasConcept C171250308 @default.
• W2562189211 hasConcept C178790620 @default.
• W2562189211 hasConcept C185592680 @default.
• W2562189211 hasConcept C192562407 @default.
• W2562189211 hasConcept C204223013 @default.
• W2562189211 hasConcept C204787440 @default.
• W2562189211 hasConcept C2779227376 @default.
• W2562189211 hasConcept C32909587 @default.
• W2562189211 hasConcept C40003534 @default.
• W2562189211 hasConcept C41008148 @default.
• W2562189211 hasConcept C44838205 @default.
• W2562189211 hasConcept C49040817 @default.
• W2562189211 hasConcept C71924100 @default.

• next