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- W2563314385 abstract "Precisely controlled heat treatment is an essential tool in the manufacture of the complex structures that constitute modern semiconductor devices. In the sequence of about 100 operations that may be required to construct a solid state integrated circuit, heat treatments occur at regular intervals: to redistribute doping elements into the required locations within the solid silicon; to anneal ion implantation damage and restore the perfect crystal structure required for satisfactory electrical behaviour; and to enable the silicon surface to react with other elements to form new layers (e.g. with oxygen to form silicon oxide dielectric and with metals to form good ohmic contacts to the silicon)." @default.
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- W2563314385 date "1980-11-01" @default.
- W2563314385 modified "2023-09-24" @default.
- W2563314385 title "Laser Annealing Of Active Areas Of Semiconductor Devices" @default.
- W2563314385 doi "https://doi.org/10.1088/0031-9112/31/9/026" @default.
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