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- W2564762311 abstract "Single alignment and double alignment back scattering of helium ions from silicon have been simulated in a computer model. The dependence of the backscattering yield profiles on the tilt plane is examined for single alignment along and the (110), (111), and (100) tilt planes for 2.1 MeV helium ions with a beam divergence of 0.04°. For off axis interstitial sites maxima in the yield profiles are found at angles which are characteristic of the particular site. In double alignment the yield profiles of 2.8 MeV helium ions backscattered from a silicon crystal with 5.10-3 interstitial silicon atoms per lattice atom are calculated for the combinations: incidence channeling, blocking direction with detector tilt in (110) and blocking direction with detector tilt also in (011). The former combination is sensitive to tetrahedral, hexagonal, and Yb positions and the latter to hexagonal. The lowest interstitial con centration to be detected is estimated to be 10-3. The efficiency of the double alignment in determining the configuration of lattice defects is compared with that of single alignment." @default.
- W2564762311 created "2017-01-06" @default.
- W2564762311 creator A5009374493 @default.
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- W2564762311 date "1975-01-01" @default.
- W2564762311 modified "2023-09-24" @default.
- W2564762311 title "INTERSTITIAL ATOM LDCATION IN SILICON BY SINGLE AND OOLBLE ALIGNf1ENT BACKSCATTERING OF MeV Hal lJvl IONS *" @default.
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