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- W2582620821 abstract "用苯作气源，采用电子回旋共振等离子体增强化学气相沉积方法制备了非晶含氢碳膜，并在该系统上用氧等离子体对这些碳膜进行了刻蚀性能的研究.实验中，测量了碳膜在不同氧压强、流量和微波功率下的刻蚀速率，研究了膜的沉积速率与它的刻蚀速率之间的关系.结果表明，膜的刻蚀速率与膜的生长条件密切相关；在低沉积速率下生长的非晶碳膜的刻蚀率低于常用的Novolak光刻胶.这种碳膜具有较强的耐刻蚀性能，可以用作微电子器件制造中的掩膜材料." @default.
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- W2582620821 date "1999-01-01" @default.
- W2582620821 modified "2023-09-25" @default.
- W2582620821 title "ETCHING PROPERTIES OF AMORPHOUS HYDROGENATED CARBON FILMS IN A MULTIPOLE ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA SYSTEM" @default.
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