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• W2588150425 abstract "Boron pile-up at the maximum melt depth for laser melt annealing of implanted silicon has been reported in numerous papers. The present contribution examines the boron accumulation in a laser doping setting, without dopants initially incorporated in the silicon wafer. Our numerical simulation models laser-induced melting as well as dopant diffusion, and excellently reproduces the secondary ion mass spectroscopy-measured boron profiles. We determine a partitioning coefficient k p above unity with k p = 1 . 25 ± 0 . 05 and thermally-activated diffusivity D B , with a value D B ( 1687 K ) = ( 3 . 53 ± 0 . 44 ) × 10 − 4 cm 2 ·s − 1 of boron in liquid silicon. For similar laser parameters and process conditions, our model predicts the anticipated boron profile of a laser doping experiment." @default.
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• W2588150425 date "2017-02-16" @default.
• W2588150425 modified "2023-09-26" @default.
• W2588150425 title "Boron Partitioning Coefficient above Unity in Laser Crystallized Silicon" @default.
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• W2588150425 doi "https://doi.org/10.3390/ma10020189" @default.
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