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• W2596932730 abstract "The diffusivity of oxygen in thin, sputter-deposited TiO2 films, as can be used in RRAMs, is measured using electron and ion backscattering techniques. The as-grown sample consisted of two layers (Ti16O2 and Ti18O2) and was annealed between 500 °C and 900 °C. The depth profiles of 18O, as measured with both techniques, were similar. The extent of diffusion was much larger than expected from the literature data for O diffusion in single-crystal rutile, suggesting that defects in the sputter-deposited film play an essential role in the diffusion process." @default.
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• W2596932730 date "2017-05-01" @default.
• W2596932730 modified "2023-10-16" @default.
• W2596932730 title "Oxygen diffusion in TiO 2 films studied by electron and ion Rutherford backscattering" @default.
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• W2596932730 doi "https://doi.org/10.1016/j.tsf.2017.03.024" @default.
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