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- W2605824392 abstract "Waveforms of discharges voltage and current and their changes due to changes of plasma parameters were studied recently. Mainly the sensitive reaction of Fourier components of discharge voltage to presence of deposited or etched thin films showed up as an useful diagnostic method of plasma processing." @default.
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- W2605824392 date "2011-01-01" @default.
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- W2605824392 title "Higher harmonic frequencies in capacitive discharges and their using for monitoring of plasma processing" @default.
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