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- W2606086039 abstract "Fabrication of crystalline Al2O3 films by the method consisting of ion beam sputtering of the Al target in an oxygen atmosphere and a simultaneous oxygen ion-irradiation toward the specimen surface was carried out.At 573 K, the simultaneous oxygen ion-irradiation under 120 kV-0.077 A/m2 conditions formed γ-Al2O3 crystal films, whereas amorphous Al2O3 was produced without oxygen ion-irradiation. At 1073 K, the γ-Al2O3 crystal was produced without oxygen ion-irradiation. On the other hand, ion-irradiation under 150 kV-0.103 A/m2 conditions created the (α+θ)-Al2O3 crystal.The γ-Al2O3 and (α+θ)-Al2O3 crystals were produced at low temperatures as compared with the conventional procedures such as PVD and CVD. Therefore the enhancement of crystallization of Al2O3 film by oxygen ion-irradiation was clarified.Wear resistance tests using the ball-on-disk method showed that disks coated with crystallized Al2O3 films had higher resistance than the amorphous Al2O3-coated and non-coated disks with increasing hardness number." @default.
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- W2606086039 date "1997-01-01" @default.
- W2606086039 modified "2023-10-05" @default.
- W2606086039 title "Preparation of Crystalline Al<SUB>2</SUB>O<SUB>3</SUB> Films by Ion Beam Sputtering Combined with Oxygen Ion-Irradiation and Their Wear Resistance Properties" @default.
- W2606086039 doi "https://doi.org/10.2320/jinstmet1952.61.6_528" @default.
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