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• W2617191737 abstract "We report the synthesis of large-area monolayer MoSe₂ films extended up to a millimeter scale on SiO₂/Si substrates by atmospheric pressure chemical vapor deposition (CVD)." @default.
• W2617191737 created "2017-06-05" @default.
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• W2617191737 date "2017-01-01" @default.
• W2617191737 modified "2023-10-16" @default.
• W2617191737 title "Large-area synthesis of monolayer MoSe₂ films on SiO₂/Si substrates by atmospheric pressure chemical vapor deposition" @default.
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• W2617191737 doi "https://doi.org/10.1039/c7ra03642f" @default.
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