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- W2617456600 abstract "A novel atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) approach toward the growth of conventional polymer layers is characterized and interpreted. A set of three methacrylate monomers (methyl, butyl, and glycidyl methacrylate) were investigated using ultrashort plasma discharges (ca. 100 ns) pulsed at various frequencies, covering a range of duty cycle from 0.1% to 0.000 316%. An unprecedented weight-average molar mass of 94 000 g mol–1 coupled to an outstanding thin film conformality and an excellent chemical functionalities retention was achieved for the best deposition conditions. Insights into the growth mechanisms in AP-PiCVD and their dependence on the monomer’s intrinsic properties are provided." @default.
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- W2617456600 date "2017-05-31" @default.
- W2617456600 modified "2023-10-18" @default.
- W2617456600 title "Atmospheric Pressure Plasma-Initiated Chemical Vapor Deposition (AP-PiCVD) of Poly(alkyl acrylates): An Experimental Study" @default.
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- W2617456600 doi "https://doi.org/10.1021/acs.macromol.7b00461" @default.
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