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- W2617483670 endingPage "676" @default.
- W2617483670 startingPage "643" @default.
- W2617483670 abstract "Atomic layer deposition (ALD) has evolved as an important tool for the design and synthesis of well-defined nanostructures for catalysis. Its self-limiting nature makes possible the preparation of catalytic materials with well-defined subnanometer and nanometer features on high-surface-area supports with near-atomic precision. This allows for the establishment of the correlation between the active site structures and catalytic performance, thus providing insights for understanding the reaction mechanism and the rational design of improved catalysts. Important examples include ALD of metal oxides for the synthesis of catalytic sites and deposition of protecting layers on other materials, modification of high-surface-area supports, and synthesis of supported monometallic and bimetallic catalysts with controlled size, composition, and morphology, among others. This chapter provides the reader with detailed information on tailoring nanostructures for catalytic applications using ALD and a discussion about the challenges and opportunities for the field." @default.
- W2617483670 created "2017-06-05" @default.
- W2617483670 creator A5030848250 @default.
- W2617483670 creator A5039071105 @default.
- W2617483670 creator A5041606741 @default.
- W2617483670 creator A5043333274 @default.
- W2617483670 date "2017-01-01" @default.
- W2617483670 modified "2023-10-14" @default.
- W2617483670 title "Well-Defined Nanostructures for Catalysis by Atomic Layer Deposition" @default.
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