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• W2617993334 abstract "This chapter reviews the use of in-situ X-ray diffraction analyses for exploring the chemical expansion produced by oxygen stoichiometry changes in thin oxide films during oxidation and reduction, as well as the kinetics of oxygen exchange at the surface of the films. This technique has demonstated to serve as a non-invasive and very selective complementary tool for fundamental studies on mixed ionic-electronic conducting materials." @default.
• W2617993334 created "2017-06-05" @default.
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• W2617993334 date "2017-01-01" @default.
• W2617993334 modified "2023-10-06" @default.
• W2617993334 title "In Situ High-Temperature X-ray Diffraction of Thin Films: Chemical Expansion and Kinetics" @default.
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• W2617993334 doi "https://doi.org/10.1007/978-3-319-51407-9_3" @default.
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