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- W2620962014 abstract "In this paper, various kinds of n-Drain Extended MOS with contact field plate are investigated. Improved on-resistance degradation is observed for all the kinds of contact field plates. Technology Computer-Aided-Design simulation reveals that the impact ionization rate in the drift region is decreased for all kinds of contact field plates." @default.
- W2620962014 created "2017-06-09" @default.
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- W2620962014 date "2017-04-01" @default.
- W2620962014 modified "2023-09-22" @default.
- W2620962014 title "Effect of contact field plate on hot-carrier-induced on-resistance degradation in n-Drain extended MOS transistors" @default.
- W2620962014 cites W2000806993 @default.
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- W2620962014 doi "https://doi.org/10.1109/irps.2017.7936373" @default.
- W2620962014 hasPublicationYear "2017" @default.
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