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- W2626300344 abstract "Ultraviolet nanoimprint lithography (UV-NIL) has become one of advanced pattering methods for fabrication of micro- and nano-structures over several inches by replication with designed mold patterns at high throughput and low cost. For practical application of UV-NIL, it is essential to eliminate bubble defects and to make residual layer thicknesses (RLTs) of a fabricated resist pattern uniform after the imprint process for subsequent dry-etching processes. We demonstrated the high-viscosity UV-curable resin (viscosity=12,800 mPas) suitable for bubble-defect-free UV nanoimprinting in a condensable gas atmosphere. We enabled to deposit droplets of the high-viscosity resin on a substrate by screen printing with a through-hole membrane with the volume of sub-pico liter. The method was effective for leveling RLTs in bubble-defect-free UV-NIL. In the present study, we give an overview of ‘Print and Imprint’ method comprising screen printing and UV-NIL, and demonstrate the position-selective placement of high-viscosity resin droplets by screen printing." @default.
- W2626300344 created "2017-06-23" @default.
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- W2626300344 date "2017-04-01" @default.
- W2626300344 modified "2023-09-22" @default.
- W2626300344 title "Print and imprint method for nanoimprint lithography with high-viscosity photo-curable resins" @default.
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- W2626300344 doi "https://doi.org/10.23919/icep.2017.7939415" @default.
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