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- W2674413950 abstract "Thermal Plasma CVD (TPCVD) is a high rate film deposition process using thermal plasma. Various functional material films, such as SiC, TiO_2, ZnO and so on, have been successfully deposited so far. In this study, to decrease the running cost, atmospheric TPCVD equipment using air working gas was developed and Titanium oxide and zinc oxide films deposition using this equipment was carried out. Consequently, it was proved that photo-catalytic titanium oxide film could be deposited even in the case of air working gas. Besides, from the result of film deposition using pulsed air plasma jet, it was proved that photo-catalytic titanium oxide film could be deposited on the ITO coated glass substrate." @default.
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- W2674413950 date "2013-01-01" @default.
- W2674413950 modified "2023-10-17" @default.
- W2674413950 title "20406 Low Temperature Titanium Oxide Film Deposition by Atmospheric Thermal Plasma CVD using Pulsed Air Plasma" @default.
- W2674413950 doi "https://doi.org/10.1299/jsmekanto.2013.19.301" @default.
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