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• W270860232 abstract "The deposition and oxidation of copper vapor deposited onto tungsten emitter tips was studied by field electron microscopy utilizing spot photometer and pulsed field techniques. Work functions of the (110), (211), (111), (310), and (611) regions of the underlying tungsten image were calculated from the intensities' after approximately seven and 14 atomic layers of copper had impinged on the tip and after a monolayer of oxygen had adsorbed on the copper. For oxygen adsorbed on the (111) plane of copper, a work function increase of 0.05 eV was obtained, whereas an increase of approximately 0.30 eV was obtained for the other regions. After the initial adsorption of oxygen on thin films of clean copper at room temperature, gross rearrangement of the surface occurred with resulting increase in emission intensity and nucleation and growth of relatively large crystallites." @default.
• W270860232 created "2016-06-24" @default.
• W270860232 creator A5007431207 @default.
• W270860232 creator A5078863491 @default.
• W270860232 date "1967-01-01" @default.
• W270860232 modified "2023-09-27" @default.
• W270860232 title "FIELD EMISSION STUDIES OF EPITAXY AND NUCLEATION OF COPPER DEPOSITED ON TUNGSTEN AND OXIDATION OF THE COPPER" @default.
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• W270860232 doi "https://doi.org/10.1016/b978-1-4832-2901-0.50012-3" @default.
• W270860232 hasPublicationYear "1967" @default.
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