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• W271511704 abstract "Thin amorphous films of superconducting (Mo0.6Ru0.4)1−xBx were prepared by magnetron sputtering in an ultrahigh vacuum (UHV) system. The superconducting properties and normal state resistivities ρ of films condensed at 77 K are discussed. We find a strong dependence on the sputter conditions of the low-temperature resistivity ρLT =ρ (25 K) and its variation upon irradiation with 20-MeV sulphur ions, although the superconducting critical temperature Tc and the temperature dependence of ρ are not strongly influenced for all films prepared. Whereas films sputtered with argon pressures below ∼10−2 mbar have resistivities of about 100 μΩ cm which are reduced 2–3% by irradiation, films sputtered with higher argon pressures have resistivities up to 1000 μΩ cm and show irradiation-induced decreases of almost 70%. Independent of this behavior, the x-ray diffraction patterns appear nearly identical, and Tc increases 6–10% with irradiation. Assuming that irradiation defects reduce the structural short-range order, the effects observed with low-resistance films could be explained by a smearing of the structure factor S(k) and an enhancement of the electronic density of states at the Fermi level N(EF). Our results suggest that the structure of high-resistance films has initially a reduced density which is increased by irradiation." @default.
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• W271511704 date "1983-02-01" @default.
• W271511704 modified "2023-10-18" @default.
• W271511704 title "Effects of preparation conditions and low‐temperature ion irradiation on superconductivity and electrical resistivity of amorphous (Mo0.6Ru0.4)1−xBxfilms" @default.
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• W271511704 doi "https://doi.org/10.1063/1.332081" @default.
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