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• W2721326217 abstract "In this study, to obtain a large deposition area, a nozzle producing vortex At plasma jet was fabricated, and titanium dioxide films was deposited by using atmospheric thermal plasma chemical vapor deposition(TPCVD). With the vortex jet, feedstock can be combusted in a relatively large area, and films can be vaporized uniformly on the substrate. It was proved that T102 films could be deposited in the condition of 673K in deposition temperature using the vortex nozzle. Anatase form and rutile form were both detected in the XRD, and composition of the film is hoped to be controlled by changed the deposition conditions." @default.
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• W2721326217 date "2013-01-01" @default.
• W2721326217 modified "2023-09-25" @default.
• W2721326217 title "20407 Effects of substrate traversing on film deposition in atmospheric thermal plasma CVD using vortex Ar plasma" @default.
• W2721326217 doi "https://doi.org/10.1299/jsmekanto.2013.19.303" @default.
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