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- W2726561539 abstract "A laser direct write process is used to selectively modify the surface and internal optical properties of silicon carbide substrates. This process enables the fabrication of embedded structures, which are the building blocks for optical and integrated optical devices. Laser metallization, a phase transformation process without the addition of metal, and laser doping, both n-type and p-type, are used to modify the optical reflectivity and transmission of select surface and embedded regions of silicon carbide (SiC) wafers. The reflectivities of these laser synthesized structures are increased by 40% compared to the parent wafer. Laser doping increases the absorption coefficient by three orders of magnitude compared to the parent wafer; this is a factor of 16 greater than that observed for conventionally doped (e.g., ion implantation) wafers. Optical properties were measured at 1064 nm laser wavelengths using intensities (∼25W/cm 2 ), which are much less than used in laser-synthesis (∼90MW/cm 2 )." @default.
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- W2726561539 date "2006-02-22" @default.
- W2726561539 modified "2023-09-23" @default.
- W2726561539 title "Laser-Synthesis of Optical Structures in Silicon Carbide" @default.
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