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• W2738680249 abstract "The substitution of nitrogen atoms in the lattice plane of the graphene can adjust the electronic properties of the graphene to translate it from the half-metal to the n-type semiconductor. Here, we report a practicable growth of nitrogen-doped graphene films with the nitrogen atoms doped content of 4.4–7.5% by the sole solid precursor based chemical vapor deposition method. After the post-annealing process at high temperature, the morphology and crystallization quality of the nitrogen-doped graphene film were considerably improved. The as-synthesized nitrogen-doped graphene films exhibit typical n-type behavior with the electron carrier density of approximately 6.55 × 1012 cm−2 and the Hall mobility of around 522 cm2V−1 s−1." @default.
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• W2738680249 date "2017-07-17" @default.
• W2738680249 modified "2023-10-16" @default.
• W2738680249 title "Synthesis of nitrogen-doped graphene via pentachloropyridine as the sole solid source" @default.
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• W2738680249 doi "https://doi.org/10.1063/1.4995228" @default.
• W2738680249 hasPublicationYear "2017" @default.
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