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- W2742802858 abstract "In this work, the films have been prepared on silicon substrates by DC magnetron sputtering using a sintered B_4C target in Ar plasma. The DC power was fixed at 250W, ad the substrate temperature was varied from 50 to 250℃. The influences of H_2 addition as a plasma gas on the nano-indentation hardness, the adhesive strength and the friction coefficient of the films were investigated. Nano-indentation studies show that the film prepared at 250℃ without H_2 addition possessed high hardness of GPa. H_2 addition had the small effect of lowering the hardness and the adhesive strength of the film to the substrate was improved significantly by H_2 addition. Therefore, H_2 addition in the film formation process is effective for producing thin films containing boron with high hardness and high adhesive strength." @default.
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- W2742802858 date "2004-01-01" @default.
- W2742802858 modified "2023-09-26" @default.
- W2742802858 title "Effects of Hydrogen Addition to B_4C Films on Their Mechanical Properties" @default.
- W2742802858 doi "https://doi.org/10.1299/jsmemecjo.2004.1.0_487" @default.
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