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• W2745065944 abstract "10nm 2nd generation BEOL technology is described with an optimized illumination system and multi-patterning lithography. While the optimized illumination system offered a possibility to pattern reduced metal pitches in the preferred orientation, difficulties of T-T and T-S patterning still remained. It was overcome by increasing the number of available multi-patterning colors from 2 to 4. First-ever implementation of LELELELE with tight inter-color misalignment control increased scalability up to 17.1% and was demonstrated with SRAM 128Mb yield." @default.
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• W2745065944 date "2017-06-01" @default.
• W2745065944 modified "2023-09-26" @default.
• W2745065944 title "10nm 2nd generation BEOL technology with optimized illumination and LELELELE" @default.
• W2745065944 doi "https://doi.org/10.23919/vlsit.2017.7998156" @default.
• W2745065944 hasPublicationYear "2017" @default.
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