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• W2746366959 abstract "Graphoepitaxy directed self-assembly is a potential low-cost solution for patterning via layers with pitches beyond the reach of a single optical lithographic exposure. In this process, selective control of the interfacial energy at the bottom and sidewall of the template is an important but challenging exercise. A dual brush process is implemented, in which two brushes with distinct end-groups are consecutively grafted to the prepattern to achieve fully independent modification of the bottom and sidewall surface of the template. A comprehensive study of hole pattern quality shows that using a dual brush process leads to a substantial improvement in terms of positional and dimensional variability across the process window. These findings will be useful to others who wish to manipulate polymer–surface interactions in directed self-assembly flows." @default.
• W2746366959 created "2017-08-31" @default.
• W2746366959 creator A5000465847 @default.
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• W2746366959 date "2017-08-21" @default.
• W2746366959 modified "2023-09-23" @default.
• W2746366959 title "Dual brush process for selective surface modification in graphoepitaxy directed self-assembly" @default.
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• W2746366959 doi "https://doi.org/10.1117/1.jmm.16.3.033503" @default.
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