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• W2748656712 abstract "Integrating bottom-up area-selective building-blocks in microelectronics has a disruptive potential because of the unique capability of engineering new structures and architectures. Atomic layer deposition (ALD) is an enabling technology, yet understanding the surfaces and their modification is crucial to leverage area-selective ALD (AS-ALD) in this field. The understanding of general selectivity mechanisms and the compatibility of plasma surface modifications with existing materials and processes, both at research and production scale, will greatly facilitate AS-ALD integration in microelectronics. The use of self-assembled monolayers to inhibit the nucleation and growth of ALD films is still scarcely compatible with nanofabrication because of defectivity and downscaling limitations. Alternatively, in this Research Article, we demonstrate a straightforward H2 plasma surface modification process capable of inhibiting Ru ALD nucleation on an amorphous carbon surface while still allowing instantaneous nucleation and linear growth on Si-containing materials. Furthermore, we demonstrate how AS-ALD enables previously inaccessible routes, such as bottom-up electroless metal deposition in a dual damascene etch-damage free low-k replacement scheme. Specifically, our approach offers a general strategy for scalable ultrafine 3D nanostructures without the burden of subtractive metal patterning and high cost chemical mechanical planarization processes." @default.
• W2748656712 created "2017-08-31" @default.
• W2748656712 creator A5020118291 @default.
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• W2748656712 date "2017-08-30" @default.
• W2748656712 modified "2023-10-02" @default.
• W2748656712 title "Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects" @default.
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• W2748656712 cites W1634267553 @default.
• W2748656712 cites W1832358967 @default.
• W2748656712 cites W1878474542 @default.
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• W2748656712 cites W1972893978 @default.
• W2748656712 cites W1974340860 @default.
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• W2748656712 cites W1977199911 @default.
• W2748656712 cites W1978399566 @default.
• W2748656712 cites W1983976801 @default.
• W2748656712 cites W1986715022 @default.
• W2748656712 cites W1991228526 @default.
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• W2748656712 cites W2021028003 @default.
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• W2748656712 doi "https://doi.org/10.1021/acsami.7b07811" @default.
• W2748656712 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/28820569" @default.
• W2748656712 hasPublicationYear "2017" @default.
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