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- W2749572438 abstract "Abstract Amorphous silica is paid attention as a material for H2 separation membranes because it shows diffusion selectivity of H2. Usually, the silica membrane is formed on a porous ceramic support in order to maintain the mechanical strength of the thin membrane. There are a sol-gel method and a chemical vapor deposition (CVD) method as a typical membrane preparation method. A silica sol is prepared by hydrolyzing a silica source such as a silicon alkoxide for the sol-gel method, and a porous ceramic substrate is coated with the solution to form a membrane. Here, we have paid attention to the CVD methods that the silica source is supplied by a vapor phase. A silica source is vaporized to deposit on a porous ceramic substrate. Silica membranes can be deposited on modules with complicated shape such as a multimembrane module because of the higher diffusivity of the vapor silica sources. The CVD method can be classified into two types, a one side geometry method and a counter-diffusion method." @default.
- W2749572438 created "2017-08-31" @default.
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- W2749572438 date "2017-01-01" @default.
- W2749572438 modified "2023-09-27" @default.
- W2749572438 title "Preparation of Silica Membranes by CVD Method" @default.
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- W2749572438 doi "https://doi.org/10.1016/b978-0-444-63866-3.00002-9" @default.
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