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- W2750837147 abstract "The lithography process for chip manufacturing has been playing a critical role in keeping Moor's law alive. Even though the wavelength used for the process is bigger than actual device feature size, which makes it difficult to transfer layout patterns from the mask to wafer, lithographers have developed a various technique such as Resolution Enhancement Techniques (RETs), Multi-patterning, and Optical Proximity Correction (OPC) to overcome the sub-wavelength lithography gap." @default.
- W2750837147 created "2017-09-15" @default.
- W2750837147 creator A5041057612 @default.
- W2750837147 date "2017-09-07" @default.
- W2750837147 modified "2023-09-27" @default.
- W2750837147 title "Lithography Hotspot Detection" @default.
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- W2750837147 doi "https://doi.org/10.15760/etd.3446" @default.
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