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• W2750947521 abstract "Texture structure is usually fabricated on crystalline silicon (c-Si) solar cells to provide a low surface reflectance by an etching method such as alkali solution. In this study, we proposed nanoimprint lithography (NIL) as a fabrication process of the texture structure on the flat c-Si surface. The fabricated nanoimprinted texture which is a moth-eye structure by zinc oxide still has a high interface reflectance since the differences of the refractive index between the texture material and the c-Si substrate is large. We proposed an insertion of a Si-rich silicon nitride (SiN) layer between the texture and the substrate to solve this problem, and confirmed that the inserted Si-rich SiN shows remarkable benefits in terms of lowering the surface reflectance and providing a high carrier lifetime of the Si absorber, simultaneously." @default.
• W2750947521 created "2017-09-15" @default.
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• W2750947521 date "2017-10-23" @default.
• W2750947521 modified "2023-09-27" @default.
• W2750947521 title "Low surface reflectance by nanoimprinted texture with silicon-rich silicon nitride layer" @default.
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• W2750947521 doi "https://doi.org/10.1088/1361-6463/aa8aee" @default.
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