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- W2751097976 abstract "Catalyst-free growth of ZnO nanostructures were synthesized on ZnO seed layers with different thickness (25–150 nm) coated glass substrates by thermal evaporation method. Prior to the growth process, the sputtered ZnO seed layers were annealed using the continuous wave CO2 laser as a heat source at 450 °C in air for 15 min. The fabrication and characterization of a metal–semiconductor–metal ultraviolet photodetectors based on ZnO nanostructures with different thickness of seed layer were successfully fabricated. Upon exposure to 365 nm light (1.5 mW/cm2) at five-bias voltage, the device with 100 nm thick seed layer showed a relatively high UV sensitivity, quick response, and high responsivity. The prototype device shows a cost effective glass substrate using thermal evaporation method for ZnO nanostructures synthesis and demonstrates the possibility of constructing nanoscale photodetectors for nano-optics applications." @default.
- W2751097976 created "2017-09-15" @default.
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- W2751097976 date "2018-01-01" @default.
- W2751097976 modified "2023-09-26" @default.
- W2751097976 title "Effects of ZnO seed layer thickness on catalyst-free growth of ZnO nanostructures for enhanced UV photoresponse" @default.
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- W2751097976 doi "https://doi.org/10.1016/j.optlastec.2017.06.031" @default.
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