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- W2755755846 abstract "We report the fabrication of periodic structures with a critical dimension of 90 nm on a fused silica substrate by i-line (λ=365 nm) proximity mask-aligner lithography. This realization results from the combination of the improvements of the optical system in the mask aligner (known as MO exposure optics), short-period phase-mask optimization, and the implementation of self-aligned double patterning (SADP). A 350 nm period grating is transferred into a sacrificial polymer layer and coated with an aluminum layer. The removal of the metal initially present on the horizontal surfaces and on top of the polymer grating leaves a 175 nm period grating on the wafer, which can be used as a wire grid polarizer. A computation of the efficiency is performed from the measured profile and confirms the deep-blue visible to infra-red operation range." @default.
- W2755755846 created "2017-09-25" @default.
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- W2755755846 date "2017-09-21" @default.
- W2755755846 modified "2023-09-24" @default.
- W2755755846 title "175 nm period grating fabricated by i-line proximity mask-aligner lithography" @default.
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- W2755755846 doi "https://doi.org/10.1364/ol.42.003816" @default.
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- W2755755846 hasPublicationYear "2017" @default.
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