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• W2765718237 abstract "Herein, the study of electrical and morphological properties of SnO 2 /Au/SnO 2 thin film is presented. The stacked multilayers were deposited on Si (100) / SiO 2 substrate by e-beam evaporation using standard SnO 2 and Au targets to get a total thickness of ∼ 75 nm. Aluminum mask was used to create an interface between pristine and 120 MeV Ni10+ irradiated (fluence-1×1012 and 5×1012 ions/cm2) region. Irradiation resulted in an increase in roughness of film from 1.21 nm to 3.03 nm. The current-voltage characteristics taken at pristine irradiated and at the interface of the pristine-irradiated region showed ohmic behavior with the interface showing better conductivity. Hall measurements show decrease in electrical resistivity from 2.2 × 10−4 Ω-cm to 1.04 × 10−4 Ω-cm post irradiation for films irradiated with 120 MeV 1012 Ni10+ ions/cm2. The optical study shows a decrease in transparency (80.97% to 78.56%) and increases in refractive index post irradiation. The possible mechanism for morphological and optoelectronic variation in the irradiated region is discussed in the manuscript." @default.
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• W2765718237 date "2016-12-01" @default.
• W2765718237 modified "2023-09-25" @default.
• W2765718237 title "Opto-electronic and morphological alteration in SnO2/Au/SnO2 thin film as a result of 120 MeV Ni10+ irradiation for TCE application" @default.
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• W2765718237 doi "https://doi.org/10.1109/icemelec.2016.8074621" @default.
• W2765718237 hasPublicationYear "2016" @default.
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