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• W2765954822 abstract "In this paper, we demonstrate a facile, lithography free, and large scale compatible fabrication route to synthesize an ultra-broadband wide angle perfect absorber based on metal-insulator-metal-insulator (MIMI) stack design. We first conduct a simulation and theoretical modeling approach to study the impact of different geometries in overall stack absorption. Then, a Pt-Al2O3 multilayer is fabricated using a single atomic layer deposition (ALD) step that offers high repeatability and simplicity in the fabrication step. In the best case, we get an absorption bandwidth (BW) of 600 nm covering a range of 400 nm-1000 nm. A substantial improvement in the absorption BW is attained by incorporating a plasmonic design into the middle Pt layer. Our characterization results demonstrate that the best configuration can have absorption over 0.9 covering a wavelength span of 400 nm-1490 nm with a BW that is 1.8 times broader compared to that of planar design. On the other side, the proposed structure retains its absorption high at angles as wide as 70°. The results presented here can serve as a beacon for future performance enhanced multilayer designs where a simple fabrication step can boost the overall device response without changing its overall thickness and fabrication simplicity." @default.
• W2765954822 created "2017-11-10" @default.
• W2765954822 creator A5005183836 @default.
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• W2765954822 date "2017-11-08" @default.
• W2765954822 modified "2023-10-16" @default.
• W2765954822 title "Disordered Nanohole Patterns in Metal-Insulator Multilayer for Ultra-broadband Light Absorption: Atomic Layer Deposition for Lithography Free Highly repeatable Large Scale Multilayer Growth" @default.
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• W2765954822 doi "https://doi.org/10.1038/s41598-017-15312-w" @default.
• W2765954822 hasPubMedCentralId "https://www.ncbi.nlm.nih.gov/pmc/articles/5678139" @default.
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• W2765954822 hasPublicationYear "2017" @default.
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