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- W2766265975 abstract "As the first step toward understanding the electrical properties of SiO2/GaN systems, the interface was characterized using high-resolution scanning transmission electron microscopy (STEM) and energy dispersive X-ray spectroscopy (EDS). An epitaxial crystalline intermediate layer with a thickness of ~1.5 nm was observed at the SiO2/GaN interface. STEM-EDS analyses revealed that this intermediate layer contained gallium and oxygen and mostly comprised the e-Ga2O3 phase. The e-Ga2O3/GaN interface was atomically smooth and free from misfit dislocations despite lattice mismatch of ~8.0%, suggesting that the initial oxidation of GaN surfaces is crucial to achieve good interfacial properties." @default.
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- W2766265975 date "2017-10-23" @default.
- W2766265975 modified "2023-10-16" @default.
- W2766265975 title "Electron microscopy studies of the intermediate layers at the SiO<sub>2</sub>/GaN interface" @default.
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