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- W2766446588 abstract "We have selected and characterized 2 cerium oxide slurries. We have then modified their pH to polish fused silica samples. The material removal rate, roughness, surface defects density and morphology have been observed as a function of pH. We noticed that while roughness and surface defect density don’t seem to be very affected by slurry pH, the latter has an influence on material removal rate and width of the scratches generated during polishing." @default.
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- W2766446588 date "2017-10-16" @default.
- W2766446588 modified "2023-10-18" @default.
- W2766446588 title "Impact of slurry pH on material removal rate and surface quality of polished fused silica" @default.
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- W2766446588 doi "https://doi.org/10.1117/12.2279798" @default.
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