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• W2766620608 abstract "In the maturing field of silicon photonics, advances continue in both design and process improvements. Waveguide propagation loss is strongly affected by sidewall roughness, and so for fabrication using e-beam lithography, loss is influenced by e-beam writing parameters. Here, the authors look specifically at fracturing strategies in data preparation for e-beam lithography, and find significant reduction in waveguide loss by utilizing advanced fracturing options. For our evaluation, the authors fabricate optical waveguides using a well-characterized, highly stable baseline fabrication process with hydrogen silsesquioxane resist exposed by a 100 kV electron beam, a high-contrast tetramethyl-ammonium hydroxide develop, and a Cl2 inductively coupled plasma etch. Using surface grating couplers for input and output, automated optical measurements are made by scanning input light in the region of the design wavelength of 1550 nm and measuring optical output power. The authors use a design cell containing grating couplers and both straight and curved waveguides with a range of lengths. The authors find a significant reduction in grating coupler insertion loss and waveguide loss along with increased uniformity by leveraging a new fracturing strategy implemented in the beamer pattern data processing software from GenISys, GmbH. Single line edge smoothing is an exposure strategy in which all feature edges are traced using a single-line shape (sometimes referred to as a single-pass line) while the bulk of the shape is then exposed with trapezoidal beam filling. The insertion loss for grating couplers written using single line edge smoothing shows a significant loss reduction of 1.2 dB as well as greatly improved uniformity. Both straight and curved waveguide losses were also reduced by use of single line edge smoothing, by 0.7 and 1.1 dB/cm, respectively. Here, the authors will discuss the likely mechanisms of this improvement as well as present additional device data using these new fracturing methods which represent a significant, incremental improvement in performance of optical waveguides written by e-beam lithography." @default.
• W2766620608 created "2017-11-10" @default.
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• W2766620608 date "2017-10-30" @default.
• W2766620608 modified "2023-09-26" @default.
• W2766620608 title "Improvement of silicon waveguide transmission by advanced e-beam lithography data fracturing strategies" @default.
• W2766620608 cites W2011959775 @default.
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• W2766620608 doi "https://doi.org/10.1116/1.4991900" @default.
• W2766620608 hasPublicationYear "2017" @default.
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