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• W2767022137 abstract "Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) is one of the most popular deposition technique used today to develop precision lower nano-dimensional films. High temperature is not usually required for synthesis of thin films in PECVD technique. The designs of the magnetic field and microwave injection system have been studied using COMSOL multi-physics and the results are presented here. The propagation of 2.45 GHz microwave power through its injection hard-wares have been studied precisely. A 700W, 2.45 GHz magnetron source is feeding microwave to the 150mm diameter cylindrical plasma cum deposition chamber through a coaxial antenna. A mode conversion takes place from coaxial to rectangular injection line. A mirror magnetic field configuration has been achieved with the help of two annular portable rare earth toroidal ring magnets of remnant magnetism 1.15 T. The magnetization direction has been considered along the length of the magnet. Particle wave interaction takes place in the plasma chamber and the produced plasma propagates into the deposition chamber to react with the precursor resulting energetic radicals. Radicals thus produced deposits on the substrate to create desired nano-dimensional films." @default.
• W2767022137 created "2017-11-10" @default.
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• W2767022137 date "2017-04-01" @default.
• W2767022137 modified "2023-09-25" @default.
• W2767022137 title "Design study of a portable permanent magnet ECR plasma source for thin film deposition" @default.
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• W2767022137 doi "https://doi.org/10.1109/iementech.2017.8076938" @default.
• W2767022137 hasPublicationYear "2017" @default.
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