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- W2767514169 abstract "Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si3N4 index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerker's conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si3N4 antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials." @default.
- W2767514169 created "2017-11-17" @default.
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- W2767514169 date "2017-11-08" @default.
- W2767514169 modified "2023-10-10" @default.
- W2767514169 title "Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space" @default.
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- W2767514169 doi "https://doi.org/10.1021/acs.nanolett.7b03613" @default.
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