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• W2768079940 abstract "Previous attempts to tune the electrical properties of large-scale graphene via nanopatterning have led to serious degradation of the key electrical parameters that make graphene a desirable material for electronic devices. We use thermal nanoimprint lithography to pattern wafer-scale graphene on a 4-in. wafer with prefabricated 25 mm2 devices. The nanopatterning process introduces a modest decrease in carrier mobility and only a minor change in residual doping. Due to the rapid fabrication time of approximately 90 min per wafer, this method has potential for large-scale industrial production. The chemiresistive gas sensing response towards NO2 was assessed in humid synthetic air and dry air, with devices showing a response to 50 ppb of NO2 only when nanopatterned." @default.
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• W2768079940 date "2017-11-06" @default.
• W2768079940 modified "2023-10-10" @default.
• W2768079940 title "Batch fabrication of nanopatterned graphene devices via nanoimprint lithography" @default.
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• W2768079940 doi "https://doi.org/10.1063/1.5010923" @default.
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